Microlithographic Pattern Generation for Optics

For the fabrication of optical and microoptical elements like gratings, lenses, waveguides, zoneplates, computer-generated holograms and so on, a lot of different fabrication technologies are available. Some of these elements are planar elements; i.e., the optical function of such elements is realized by a thin planar layer containing special structures and/or materials. For the fabrication of such elements, lithographic technologies are employed very often. The inter-relation between the function and quality of an optical element and the fabrication technology applied is important for the further development of optics. In the current paper, we focus on this cross-relation for lithographic fabrication technologies. In a first part, an overview on several lithography methods is given. Then, laser beam writing and electron beam writing (as the two methods which are mainly used for commercial fabrication) are discussed in more detail. Finally, the current state of the art is shown. In the second part of the paper, the advantages and drawbacks of lithography for the fabrication of optical elements are addressed. Since the development of lithography tools is actually strongly driven by the semiconductor technology, the differences between the semiconductor domain and optics are discussed from the lithography tool supplier’s point of view.